AlixLabs presents HAR narrow-fin patterning at ECS 248
October 16, 2025

AlixLabs Wins Top Honors at the IC Taiwan Grand Challenge

We are proud to announce that our innovative APS™ (Atomic Layer Etch Pitch Splitting) technology has been recognized with top honors at the IC Taiwan Grand Challenge, standing out among more than 150 international startups.

The award ceremony took place at the Taipei World Trade Center, where our team was represented by Amin Karimi, Robin Athle, and Bert Sie. This recognition highlights the growing international attention our work with APS™ is receiving across the semiconductor industry.

APS™ is being developed to make leading-edge logic manufacturing more affordable and accessible, addressing one of the industry’s most critical challenges. As Taiwan remains a global hub for advanced semiconductor production, this acknowledgment is especially meaningful to us.

We extend our sincere gratitude to everyone contributing to this achievement — both our dedicated team at the AlixLabs headquarters in Lund, Sweden, and the organizers at the Taiwan Computer Association.

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