We are proud to announce that our innovative APS™ (Atomic Layer Etch Pitch Splitting) technology has been recognized with top honors at the IC Taiwan Grand Challenge, standing out among more than 150 international startups. – October 20, 2025
AlixLabs has been selected as a winning company from the third batch of the IC Taiwan Grand Challenge, an international competition that recognizes groundbreaking innovations in semiconductor and related technologies. – August 28, 2025
For the third consecutive year, AlixLabs has been recognized on the EE Times Silicon 100 list, cementing our place among the world’s most innovative semiconductor startups. – August 11, 2025
Co-financed by ASCENT+ and leveraging Fraunhofer IPMS metrology for advanced defect control, the collaboration aims to cut costs, reduce environmental footprint, and enhance water recycling. – August 7, 2025
Swedish semiconductor startup’s APS™ patent portfolio continues to grow with new U.S. patent, marking the company’s 10th pending global patent. – May 6, 2025
Atomic Layer Etching Pitch Splitting (APS) proven on more industry-leading wafers, doubling fin density and proving flexibility without EUV. – April 10, 2025
We are proud to announce that our innovative APS™ (Atomic Layer Etch Pitch Splitting) technology has been recognized with top honors at the IC Taiwan Grand Challenge, standing out among more than 150 international startups.
AlixLabs has been selected as a winning company from the third batch of the IC Taiwan Grand Challenge, an international competition that recognizes groundbreaking innovations in semiconductor and related technologies.