AlixLabs’ APS™ Delivers 10 nm Precision & Cost Savings

Please amaze yourself by our Disruptive APS(TM) Technology. Here we show critical dimensions (CDs) of 10 nm in an amorphous silicon mask at a 20 nm Half Pitch – that´s like butter on the bread in semiconductor manufacturing used multiple times in the manufacturing of several chips in your phone.

One of the reasons why your phone is so expensive is that those chips are made with several masks using Extreme Ultra Violet Lithography (EUV) and other masks using extremely complicated Self-Aligned Quadruple Patterning (SAQP) – AlixLabs APS(TM) aims to change that!